世界における半導体マイクロリソグラフィ技術の進歩

Abstract

This research service deals with the advances in next generation microlithography technologies.

Table of Contents

1 EXECUTIVE SUMMARY

• Overview of Lithography Technology
  • Lithography and its Role in Semiconductor Fabrication
  • Highlights and Key Findings
• Scope and Methodology
  • Scope of the Research Service
  • Research Methodology

2 THE SEARCH FOR NEXT GENERATION LITHOGRAPHY

• Why is it Important?
  • The Need to Support Technological Evolution
  • Major Issues
• Analysis of the NGL Candidates
  • Trends in NGL
  • NGL Technologies - A Foresight

3 OPTICAL LITHOGRAPHY

• Overview and Current Status of Optical Lithography
  • Optical Lithography--Overview
  • Current Status of Development
• Immersion Lithography
  • Immersion Lithography--Overview
  • Immersion Lithography--Technology Challenges
• Extreme Ultraviolet Lithography (EUVL)
  • EUVL--Overview
  • Technology Benefits
  • EUVL Research Groups
  • EUVL--Technology Challenges
• 157 nm Lithography
  • The End of 157 nm Lithography?
  • Technology Challenges
• Key Technology Developments--I
  • High-Power EUVL Source--Powerlase Limited--UK
  • Effect of Resist Blurring on the Resolution of Arf Immersion Lithography--Canon Inc.--Japan
  • The Rise of Inverse Lithography Technology--Luminescent Technologies Inc.--USA
  • Special Routing Technique to Reduce Defect Density--TSMC--Taiwan
  • 3D Lithography Technology for Nanostructures--Focal Point Microsystems LLC--USA
  • OPC Simulation to Minimize Cost of Mask Development--Mentor Graphics Corporation--USA
  • Industry Group to Introduce EUVL for 45 nm--EUVA--Japan
  • First EUV Exposed Image--A Milestone in Microlithographic Research--University at Albany--USA
  • Advanced DFM Lithography Solution for 45 nm and below--Nikon Precision Inc and Synopsys Inc--USA
  • Extending the Limits of Photolithography--IBM Almaden Research Center--USA
• Key Technology Developments--II
  • The Merger of Computational and Wafer Lithography--Brion Technologies Inc--USA
  • Nanolithograhic Enhancement by Application of Nanoscale Ridge Apertures--Purdue University--USA
  • The Right Source for EUVL--Cymer Inc--USA
  • Leading in Immersion and EUV Lithography--ASML--Netherlands
  • X-Ray-Based Micro-/Nanomanufacturing--Singapore Synchrotron Light Source--Singapore
  • Interface Lithography--National Institute for Matter Physics--Italy

4 ELECTRON PROJECTION LITHOGRAPHY AND MASKLESS LITHOGRAPHY

• Introduction
  • Maskless Lithography
  • Electron Projection Lithography (EPL)
  • Electron Proximity Projection Lithography
• Maskless Lithography
  • Electron Beam Lithography
  • O-ML2 and CP-ML2
  • Ion Beam Lithography
  • Mix and Match Strategy
• Electron Projection Lithography
  • Current Status of EPL
  • Technology Challenges and Potential Solutions
• Electron Proximity Projection Lithography
  • Current Status of LEEPL
  • Advantages and Challenges
• Key Technology Developments Related to this Sector
  • A New Approach using Interference Lithography with Deep Reactive Ion Etching-University of California--USA
  • A New Way to Create Nanogaps--University of Pennsylvania--USA
  • Variable-Pressure E-Beam Lithography--Northwestern University--USA

5 NANOIMPRINT LITHOGRAPHY

• Introduction and Technology Description
  • Introduction
  • NIL Technologies and Applications
• Key Adoption Factors
  • NIL Technology Benefits
  • Major Challenges
  • Technical Requirements and Current Status of NIL
• Key Technology Developments Related to NIL Sector
  • A New Holographic Contact Lithography Approach for Photonic Crystals--National University of Singapore--Singapore
  • Imprint Lithography--A Viable Alternative for NGL--Molecular Imprints--USA
  • Major Issue in NIL Resolved--Nanonex Corp and Princeton University--USA
  • High-Precision Aligner Systems for NIL--EV Group--Austria
  • Advanced NIL Technique for Research and Industrial Applications--Obducat AB--Sweden

6 NGL--TECHNOLOGY FORESIGHT; FUNDING ANALYSIS

• Future Outlook--Analyst Insights
  • Overview of NGL Technologies
  • Future of Optical Lithography
  • 157 nm Immersion Lithography for 32 nm?
  • Direct-Write Lithography and Electron Projection Lithography
  • Extreme Ultraviolet Lithography
  • Nanoimprint Lithography
• Major Fundings and Grants
  • DARPA and NIST Have Ceased Funding for US Maskless Lithography
  • Four Texan Startups Receive AMRC Funding
  • US Commerce Department Holds New Funding Competition for High-Risk Industrial Research
  • University of Albany' s NanoCollege and Vistec Lithography Receive Funding from New York State Office
  • Veeco Receives Further Funding from SEMATECH for EUVL Mask Tools
  • Major Funding for El-Mul' s Nanotube E-Beam Field Emitter
  • Multimillion Pound Funding Boost for Research at James Watt Nanofabrication Centre
  • Molecular Imprints Secures More Funding

7 KEY PATENTS AND CONTACT DETAILS

• Recent Patents
  • List of Key Patents from Market Leaders
  • Analysis of Patents from Emerging Companies in this Sector
• Contact Details
  • Corporates
  • Universities and Research Institutes

8 DECISION SUPPORT DATABASE

• Decision Support Database Tables
  • Global OLED Market (2002-2012)
  • Global LCD Sales (2002-2012)
  • Consumer Electronics Contribution to Electronics Industry--2002 to 2012